Vishay CRCW 22 kΩ, 1206 Thick Film Surface Mount Resistor ±1 % Surface 0.5 W - CRCW120622K0FKEAHP
- RS庫存編號:
- 812-1843
- 製造零件編號:
- CRCW120622K0FKEAHP
- 製造商:
- Vishay
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TWD1.40
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TWD1.47
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- RS庫存編號:
- 812-1843
- 製造零件編號:
- CRCW120622K0FKEAHP
- 製造商:
- Vishay
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選取全部 | 屬性 | 值 |
|---|---|---|
| 品牌 | Vishay | |
| Resistance | 22kΩ | |
| Product Type | Surface Mount Resistor | |
| Resistor Type | High Power | |
| Technology | Thick Film | |
| Package/Case | 1206 | |
| Packaging | Paper Tape | |
| Tolerance | ±1 % | |
| Power Rating | 0.5W | |
| Voltage | 200V | |
| Temperature Coefficient | -100 ppm/K, +100 ppm/K | |
| Mount Type | Surface | |
| Automotive Standard | AEC-Q200 | |
| Minimum Operating Temperature | -55°C | |
| Series | CRCW | |
| Maximum Operating Temperature | 155°C | |
| Length | 3.1mm | |
| Termination Style | Solder | |
| Width | 1.6mm | |
| Standards/Approvals | AEC-Q200EN 140401-802EN 60115-1EN 60115-8GADSLIEC 60068IEC 62474REACHRoHS | |
| Height | 0.5mm | |
| 選取全部 | ||
|---|---|---|
品牌 Vishay | ||
Resistance 22kΩ | ||
Product Type Surface Mount Resistor | ||
Resistor Type High Power | ||
Technology Thick Film | ||
Package/Case 1206 | ||
Packaging Paper Tape | ||
Tolerance ±1 % | ||
Power Rating 0.5W | ||
Voltage 200V | ||
Temperature Coefficient -100 ppm/K, +100 ppm/K | ||
Mount Type Surface | ||
Automotive Standard AEC-Q200 | ||
Minimum Operating Temperature -55°C | ||
Series CRCW | ||
Maximum Operating Temperature 155°C | ||
Length 3.1mm | ||
Termination Style Solder | ||
Width 1.6mm | ||
Standards/Approvals AEC-Q200EN 140401-802EN 60115-1EN 60115-8GADSLIEC 60068IEC 62474REACHRoHS | ||
Height 0.5mm | ||
1206 High Power Thick Film Chip Resistors, CRCW HP e3 Series - 0.75W
Excellent pulse load capability
Enhanced power rating
Double side printed resistor element
Metal glaze on high quality ceramic
Protective over glaze
Excellent stability (ΔR/R ≤ 1 % for 1000h at 70 °C)
Lead (Pb)-free solder contacts on Ni barrier layer
Pure tin plating provides compatibility with lead (Pb)-free and lead containing soldering processes
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